Recording film for charged electron beam recording

ABSTRACT

The recording film for charged electron beam recording according to this invention has an electrically conductive coating of RbAg4I5 provided on the recording film. The RbAg4I5 coating exhibits an excellent low surface resistivity in comparison with any conventional coating. The charged electron beam recording film of this invention has, furthermore, a protective coating of water-impermeable resin on the RbAg4I5 coating for preventing it from being attacked by water or moisture.

States Patent [1 1 ale RECORDING FlLM FOR CHARGED ELECTRON BEAM RECORDING Inventors: Takuji Kaneda; Eiichi Mizuki, both of Asaka, Japan Fuji Photo Film Co., Ltd., Kanagawa, Japan Filed: Dec. 23, 1971 Appl. No.: 211,466

Assignee:

Foreign Application Priority Data Dec. 26, 1970 Japan 45/118985 References Cited UNITED STATES PATENTS 4/1966 Trevoy 117/201 Oct. 30, 1973 Fram et a1. 250/65 3,336,596 8/1967 Dubbe et a1. 117/218 X 3,428,451 2/1969 Trevoy 117/218 X 3,689,768 9/1972 Sato et al 2501495 Primary ExaminerWilliam F. Lindquist Attorney-Richard C. Sughrue et a1.

4 Claims, 7 Drawing Figures 2 I V A 4 I 3 30 1 i 30 RECORDING FILM FOR CHARGED ELECTRON BEAM RECORDING BACKGROUND AND SUMMARY OF THE INVENTION This invention relates to a recording film for electron beam recording, and particularly to an electrically conductive coating on such a film.

This invention providesa novel recording film for electron beam recording including a transparent coating of rubidium silver iodide (RbAg,l,-,) as an electrically conductive coating which is provided on a film base of triacetylcellulose (TAC) or polyethylene terephthalate (PET) with silver halide emulsion coated thereon.

BRlEF DESCRIPTION OF THE DRAWINGS The details of the recording film according to this invention, as to its method of manufacturing and advantages, may be seen from the following description and examples, which are to be read with reference to the accompanying drawings, in which:

FIG. l is a sectional view of a conventional recording film for electron beam recording, which has been used in the prior art for electron beam recording;

FIG. 2 illustrates the construction of the recording film for charged electron beam recording to the present invention; and

FIGS. 3a, 3b, 4a, 4b and 5 are the photographs showing the recorded images of the lattice pattern given by the electron beam, i.e., electronbeam-lattice pattern on the conventional recording film and the recording film of this invention for the purpose of comparison therebetween.

DESCRIPTION or THE PREFERRED E PQP ME The recording film of this invention comprises, as shown in FIG. 2a, a film base 1 of TAC or PET, AgX emulsion 2 painted on the one surface of the film base 1., an electrically conductive coating 3 of the compound RbAg l with transparency and an electric conductivity of about 0.2 (ohms cm) at room temperature which coating 3 is provided for removing the charge stored in the recording film and deposited by vacuum evaporation or painted with being mixed into a proper organic solvent on the other surface of the film base i, and a protective coating 4 of waterimpermeable resin, e.g., Toshiba Silicon TS 911 dissolved into cyclohexane or such, lacquer made of PET or nitrocellulose (NC) dissolved into organic solvent or the like, which coating 4 is painted onto the RbAg,l coating 3 in about 21.0 thickness for preventing the coating 3 from being attacked by water or moisture. Furthermore, the recording film of this invention may be constructed in the manner shown in FIG. 2 b, wherein there are provided a TAC or PET film base 1, a RbAgJ, coating 3 deposited by vacuum evaporation or painted with being mixed into a proper organic solvent onto the film base I for removing the charge in the film, a protective coating 4 of lacquer made of PET or NC dissolved into organic solvent or the like which is painted in 5 to 10p. thickness on the RbAg l coating 3 in order to prevent it from being attacked by water or moisture, and AgX emulsion 2 painted onto the protective coating 4.

The RbAg I coating, used in the charged electron beam recording film of this invention, preferably has an electric conductivity about 10 times higher than the AgX coating at room temperature, and it is transparent. The charged electron beam recording film of this invention can, therefore, perform the excellent resolv ing-power in comparison with the conventional electron beam recording film having the construction shown in FIG. 1 (see the photographs in FIGS. 3, 4 and 5), and the existence of the RbAg l coating provides no undesirable influence upon the sharpness of recorded images on the film because of its transparency. Moreover, since this material is non-photosensitive and non-fluorescent, there is caused no fog on the recorded images and, accordingly, it is excellently effective as the electrically conductive coating to remove the charge in the film. On this point, though the coating of polyvinyl alcohol (PVA) or such mixed with fine powder or metal or carbon has been painted as the electrically conductive coating at the position of the RbAg l coating in FIG. 2a, that coating is non-transparent and accordingly there has been caused great inconvenience because that coating has to be removed after recording. Thus, it will again be apparent that the RbAgJ coating is excellently effective as the electrically conductive coating for charged electron beam recording film.

In addition, as to the performance of the electrically conductive coating according to this invention, it has a surface resistivity of about 3 X 10 ohms per square, while a copper iodide (Cul) coating, well known by its good conductivity, has a surface resistivity of about 4 X 10 ohms persquare (see U.S. Pat. No. 3,428,451). In other words, the RbAg l5 coating has about 10 times better conductivity than the Cul coating. Furthermore, the electrically conductive coating of silver iodide Agl grains and potassium iodide grains dissolved into an organic solvent (see US.

. Pat. No. 3,245,833 and British Pat. No. 998,642)

has a surface resistivity of 5 X 10 ohms per square on the average, though with considerable variation depending upon its process of manufacture, so that it is also inferior to the RbAg l5 coating by less than 1/10 in its conductivity. Besides, the conductive coating made by mixing metal or carbon powder into PVA or such has a relatively high surface resistivity of 10 ohms per square. The RbAg,,l coating thus is excellently effective as the electrically conductive coating for the charged electron beam recording film.

In the case of the charged electron beam recording film comprising a TAC or PET film base, an AgX emulsion painted thereon, and a RbAg I coating provided on the AgX emulsion, the inventors have found that the RbAg I coating functions tocause a delay in the development of the film. Also, it is practically convenient that there are provided the un-covered portions 30, i.e., terminals 30 in the RbAg,,l coating covered with the protective coating 4 in order to earth the film, as shown by the hatching in FIG. 2. v

The following examples are set forth to demonstrate the above-described superior performance of the recording film of the present invention.

EXAMPLE 1 FIG. 3a is a photograph of the recorded image on the conventional electron beam recording film, which was obtained by irradiation to record the electron beamlattice pattern, which has about 12 mm length (13 latticc-beams) and about ll mm width (11 latticebeams), and is produced by an electron beam having an accelerating voltage of 20 KeV, electron beam current of 40 muA and an irradiating duration of H30 sec at one time, 4 times at the intervals of 0.5 sec., then developing it with FD131 developer and enlarging it about three times. i

FIG. 3b is the photograph of the recorded image on the charged electron beam recording film of the present invention, having the RbAgJ coating with a surface resistivity of 2 X lOohms per square, whichwas obtained by irradiation to record the above-described electron beam-lattice pattern four times at the intervals of about 0.5 sec., then developing it with the abovedescribed developer and enlarging it three times. lt'will be readily seen from the photographs that the charged electron beam recording film of this invention has higher resolving-power in comparison with the conventional recording film. 7 l

- EXAMPLE II F 10. 4a is a photograph of the recorded image on the conventional electron beam recording film, which was obtained by irradiation to record the electron beamlattice pattern, which has about 12 mm length (13 latticebeams) and about 1 1 mm width (1 l latticebeams), and is produced by an electron beam having an accelerating voltage of 20 Kev, electron beam current of 40 muA and irradiating duration of 1/30 sec. at one time, eight times at the intervals of about 0.5'sec., then developing it with FD-131 developer and enlarging it about three times.

FIG. 4b is the photograph of the recorded image on the charged electron beam recording film of this invention, having the RbAgJ coating with a surface resistivity of 3 X ohms per square, which was obtained by irradiation to record the above-described electron beam-lattice pattern eight times at the intervals of about 0.5 sec., then developing it with the abovedescribed developer and enlarging it about three times. It will be readily seen from the photographs that, the charged electron beam recording film of this invention has higher resolving-power in comparison with the conventional recording film.

EXAMPLE lll FIG. 5 is the photograph of the recorded image on the recording film, which consists of the conventional electron beam recording film portion (a) and the charged electron beam recording film portion (b) provided according to this invention, the latter having the RbAgJ, coating with the surface resistivity of 4 X 10 ohms per square, by irradiating the electron beam lattice pattern, which has about 12 mm length (13 lattice-beams) and about 11 mm width l 1 lattice-beams) and is produced by an electron beam having an accelerating voltage of 20 KeV, electron beam current of muA and irradiating duration of H30 sec. at one time, eight times at the intervals of about 0.5 sec., then developing it with FD-l3l developer and enlarging it about three times. As is apparent from the photograph, the charged electron beam recording film portion (b) provided according to the present invention shows a higher resolution than the conventional re'cordingfilm portion (a);

-What is claimed is: i

1. In a recording film for charged electron beam recording comprising a substantially non-conductive film substrate having thereon a silver halide coating sensitive to a charged electron beam, the improvement which comprises said substrate also having thereon an electrically conductive continuous coating of rubidium silver iodide (RbAg I the electrical conductivity of said rubidium silver iodide coating being at least 10 times higher than that of said silver halide coating.

2. A recording film for charged electron beam recording as set forth in claim 1, wherein said RbAg l coating is provided on the surface of said substrate opposite to that having said silver halide coating thereon.

3. A recording film for charged electron beam recording as set forth in claim 1, wherein said RbAg,,I

4. A recording film for charged electron beam recording as set forth in claim 1, further including a protective coating of water-impermeable resin provided on said RbAg l coating. 

2. A recording film for charged electron beam recording as set forth in claim 1, wherein said RbAg4I5 coating is provided on the surface of said substrate opposite to that having said silver halide coating thereon.
 3. A recording film for charged electron beam recording as set forth in claim 1, wherein said RbAg4I5 coating is provided between said silver halide coating and said substrate.
 4. A recording film for charged electron beam recording as set forth in claim 1, further including a protective coating of water-impermeable resin provided on said RbAg4I5 coating. 